Me postulé en línea. El proceso tomó 5 meses. Acudí a una entrevista en NBCUniversal
Entrevista
I had a generally positive experience with the Page Program hiring process, the only frustration being its duration. I applied in June online, video interviewed in July, participated in an in-person panel interview in August, and heard back 9 weeks later in November. Once getting into the program there is an additional wait because you can only enter when a current Page leaves. The program administrator was generally very responsive and nice, answering emails promptly (besides within that 9 week period). At the panel interview, I got a similarly pleasant vibe from the other interviews and employees. I would suggest researching the program and company thoroughly online before your interviews, and a poised, well-articulated presentation seemed better received than theatrics in the panel interview.
Preguntas de entrevista [1]
Pregunta 1
What is something you would implement to improve the company?
Me postulé en línea. El proceso tomó 2 meses. Acudí a una entrevista en NBCUniversal (New York, NY) en mar 2026
Entrevista
First is a standard application process. Second interview is a HireVue with 4 total questions. Final interview is a 3-hour long panel interview with other candidates. For the final interview, you have a ground project, individual questions within the entire group, and a 30-minute 1-on-1 interview.
You are required to upload a resume and an optional cover letter which I did. Then they send a hireview with four questions. Overall it is a simple process and easy to follow.
Preguntas de entrevista [1]
Pregunta 1
When is a time you made an impact for a current employer
Me postulé en línea. El proceso tomó 4 semanas. Acudí a una entrevista en NBCUniversal (New York, NY) en feb 2025
Entrevista
Former intern hirevue- past interns did screening first then regular applicants. Process was pretty standard and very quick. I was asked three questions; the fourth was to upload my resume. Waiting to hear back took about a month.